调制中频高功率脉冲磁控溅射电源的设计  

Modulation frequency high power pulsed magnetron sputtering power supply design

作　　者：张凤晓[1] 王浪平 

机构地区：[1]装甲兵技术学院通信教研室,吉林长春130117

出　　处：《无线互联科技》2015年第18期55-56,共2页Wireless Internet Technology

摘　　要：文章指出叠加直流的HPPMS技术有直流部分占空比较高和不可控制2大缺点,在做沉积薄膜实验时无法提供溅射所需的高功率,导致空比较低,溅射效率稍低的高功率脉冲产生。为了解决问题,需要研制一台电源,并且该电源可以用中频调制脉冲高功率磁控溅射MPP(Modulated pulsed power),普通高功率磁控溅射系统中的直流部分可以用低频脉冲来代替,尽可能减少低频脉冲占空比并且可以确保充分预处理,使高功率脉冲占空比尽可能最大,提高系统的溅射效率。Superposition of HPPMS technology two big shortcomings has： the duty cycle is higher, and not control, when deposition film experiment cannot provide high power needed for the sputtering, lead to empty is lower, lower sputtering efficiency high power pulse is generated. In order to solve the problem, need to develop a power supply, and the power supply can use the intermediate frequency modulation pulse high power magnetron sputtering MPP （Modulated pulsed power）, ordinary high power dc magnetron sputtering system of part of low frequency pulse can be used in place of, as far as possible to reduce low frequency pulse duty ratio and can ensure adequate pretreatment, the high power pulse duty ratio as maximum as possible, improve the sputtering efficiency of system.

关 键 词：调制脉冲 磁控溅射 HPPMS MPP 

分 类 号：TN86[电子电信—信息与通信工程]