射频磁控溅射法在柔性聚酰亚胺衬底上制备ZnS薄膜及其特性研究  

Study on Properties of ZnS Thin Films Prepared on Flexible Polyimide Substrate by Radio Frequency Magnetron Sputtering

作　　者：许佳雄[1] 辛辅炼 魏坚烽 黄俊彬[1] 温楚雄[1] 邱莎莎[1] 

机构地区：[1]广东工业大学材料与能源学院,广州510006

出　　处：《半导体光电》2015年第5期756-759,764,共5页Semiconductor Optoelectronics

基　　金：中国博士后科学基金面上资助项目(2012M521575);广东工业大学大学生创新创业训练计划项目(xj201311845089)

摘　　要：为使Ⅱ-Ⅵ族化合物ZnS薄膜具有可弯曲性,选用柔性的聚酰亚胺作为衬底材料,用射频磁控溅射法沉积ZnS薄膜,对所制备薄膜的结晶结构、组分和光学特性进行分析。实验结果表明,所制备薄膜为结晶态的闪锌矿ZnS结构,择优取向为(111)晶面,晶粒尺寸为25.6nm。薄膜组分接近化学计量比,并具有少量的S损失。薄膜在可见光区和近红外光区的平均透射率分别为82.0%和90.5%,透光特性良好。作为对比,在钠钙玻璃衬底上溅射的ZnS薄膜的结晶度高于聚酰亚胺衬底薄膜,但其透射率略低于柔性ZnS薄膜。实验结果表明了用磁控溅射法在柔性聚酰亚胺衬底上制备ZnS薄膜的可行性。The flexible polyimide was used as the substrate material to realize the flexibility of Ⅱ-Ⅵ compound ZnS thin films.The ZnS thin films were fabricated by radio frequency magnetron sputtering,and the crystalline structure,composition,and optical properties were analyzed.The experimental results show that the prepared thin films are crystalline sphalerite ZnS structure.The preferred orientation is alone the（111）plane and the grain size is 25.6nm.The composition of thin films is near-stoichiometry and shows slight S-loss.The average transmittance of thin films in the visible and near infrared region is 82.0% and 90.5%,respectively,indicating the promising transmission properties.For comparison,the crystallinity of ZnS thin films on soda-lime glass substrate is higher than that of thin films on polyimide substrate.But the transmittance of glass substrate samples is slightly lower than that of the flexible thin films.The experimental results reveal the feasibility of the preparation of ZnS thin films on flexible polyimide substrate by magnetron sputtering method.

关 键 词：ZNS薄膜 柔性衬底 磁控溅射 XRD 透射率 

分 类 号：TN304.2[电子电信—物理电子学]