立体端面光刻工艺研究  

Solid Surface Lithography Technics Research

作　　者：芦刚[1] 周占福[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176

出　　处：《电子工业专用设备》2015年第7期23-28,共6页Equipment for Electronic Products Manufacturing

摘　　要：立体端面的特种器件,要求在其单侧或者双侧表面光刻出有位置要求的图形。针对这一特种器件的要求,研制了一种可适应立体端面基体的对准工作台及楔形误差补偿机构,并根据立体端面的物理特性,在旋转涂胶法的基础上,研制了适应其涂胶工艺的装夹机构,通过工艺实验,验证了该光刻工艺的可行性。Solid surface special type device need to generate lithography figure on single side or double side of the device. According to the requirement of the special device, an alignment stage and a wedge error compensation framework are developed to adapt it, and also based on the physics characteristic of the solid surface, a clamping framework is designed to adapt its coating technology, and according to the technics experiment, the feasibility of the lithography technics is confirmed.

关 键 词：立体端面 楔形误差补偿 涂胶 光刻工艺 曝光分辨率 

分 类 号：TN305.7[电子电信—物理电子学]