CMP设备兆声清洗原理及应用  

The Megasonic Cleaning Theory and its Application in the Post CMP Cleaning

作　　者：史霄[1] 郭春华[1] 杨师[1] 熊朋[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2015年第11期32-35,共4页Equipment for Electronic Products Manufacturing

摘　　要：从空化作用和声波流作用两方面对兆声清洗的物理原理进行深入分析,研究了兆声频率及功率对空化强度、边界层厚度、声波流速等关键因素的影响,从而阐明兆声波清洗的特点及其适用场合。同时以AMAT公司的设备为例,介绍了兆声波清洗在CMP后清洗中的实际应用案例。The paper analyses the principles of megasonic cleaning from the cavitation effect and acoustic streaming effect, and the influence of megasonic frequency to the cavitation strength, boundary thickness and acoustic streaming velocity. The characteristics of megasonic clean and its application are achieved. And then the application in the Post CMP Cleaning is introduced by taking the CMP equipment of AMAT as an example.

关 键 词：兆声波清洗 兆声频率 化学机械平坦化 后清洗 

分 类 号：TN30[电子电信—物理电子学]