基于准分子激光的X光掩膜板与压电陶瓷加工  

Micro Fabrication of X-Ray Lithography Mask and Piezoelectric Ceramic Based on Excimer Laser

作　　者：李以贵[1] 颜平[1] 黄远[1] 杉山进[2] 

机构地区：[1]上海应用技术学院理学院,上海201418 [2]日本立命馆大学微系统系

出　　处：《微纳电子技术》2015年第12期786-790,共5页Micronanoelectronic Technology

基　　金：国家自然科学基金重点项目(51035005);上海市联盟计划资助项目(LM201441);上海应用技术学院光电精密检测平台建设项目(10210Q140005);上海应用技术学院引进人才启动基金资助项目(YJ2014-03)

摘　　要：随着元器件的微型化、精密化发展,对快速微细加工提出了巨大需求。基于准分子激光微细加工技术,以串行加工方式加工了X光掩膜板图形结构和压电陶瓷(PZT)微结构。研究了波长为248 nm KrF准分子激光微细加工技术的最优加工条件,获得了高质量的X光光刻用的掩膜板和PZT微结构。基于X光掩膜板,采用聚甲基丙烯酸甲酯(PMMA)为光刻胶进行X光光刻,获得了高深宽比的六角形蜂窝微结构。通过输入不同的加工参数来激光加工PZT基板,获得了加工参数与PZT基板加工深度的关系。通过对加工好的PZT微结构和六角形蜂窝微结构的测试,结果表明利用准分子激光器可实现快速微细加工的目的。With the developments of miniaturization and exactness of components,the rapid micro fabrication is required.The X-ray mask pattern structure and piezoelectric ceramic（PZT）microstructures were fabricated by excimer laser micromachining technology and serial processing mode.The optimal processing conditions of the KrF excimer laser micromachining technology with the wavelength of 248 nm were studied to obtain the high quality X-ray lithography mask and PZT microstructures.Based on the X-ray lithography mask,the X-ray mask pattern structure was transferred to polymethylmethacrylate（PMMA）resist substrate,and the high-aspectratio hexagonal honeycomb microstructure was obtained.By inputting different processing parameters for the laser machining PZT substrate,the relationships between the processing parameters and processing depth of PZT substrate were obtained.The test results of the fabricated PZT microstructures and hexagonal honeycomb microstructure show that the excimer laser can achieve the purpose of rapid micro fabrication.

关 键 词：微细加工 准分子激光 X光光刻 X光掩膜板 压电陶瓷(PZT) 

分 类 号：TN305.7[电子电信—物理电子学]