基于特殊X射线光刻技术的空心微针制备技术  

Fabrication of Hollow Micro Needle Array Based on Special X-ray Lithography

作　　者：李以贵[1] 颜平[1] 黄远[1] 祝宁[1] 

机构地区：[1]上海应用技术学院理学院,上海201418

出　　处：《上海应用技术学院学报（自然科学版）》2015年第4期384-386,共3页Journal of Shanghai Institute of Technology: Natural Science

基　　金：上海应用技术学院人才引进基金资助项目(YJ2014-03);上海应用技术学院重点学科平台资助项目(10210Q140005)

摘　　要：介绍了2种基于特殊X射线光刻技术的空心微针制备方法.一种为基于2次不同X射线光刻技术的制备方法,即第1次为通常意义的带掩膜板光刻,第2次为无掩膜板光刻;另一种为基于2次移动掩膜板光刻加1次通常意义的带掩膜板光刻技术的制备空心微针方法.结果表明:在面积为5mm×5mm的聚合物基板上制备了25根空心微针阵列.Two methods for fabricating hollow micro needle arrays were introduced.One method was that fabricating hollow micro needle array based on double X-ray exposures,namely,one was normal X-ray exposure with X-ray mask and the other was X-ray exposure without X-ray mask.The other fabrication method was that hollow micro needle was fabricated by using moving mask X-ray exposures and an alignment X-ray exposure.The feasibilities for the hollow micro needle arrays were demonstrated by fabricating 25 micro needles in a 5mm×5mm polymer chip.

关 键 词：空心微针 X射线光刻 对准 

分 类 号：TN305.7[电子电信—物理电子学]