用于数字光刻的非对称式投影物镜设计  

Design of non-symmetrical projection lens for digital lithography

作　　者：邝健[1] 周金运[1] 郭华[1] 

机构地区：[1]广东工业大学物理与光电工程学院,广东广州510006

出　　处：《应用光学》2016年第1期52-56,共5页Journal of Applied Optics

基　　金：国家自然科学基金资助项目(61475037)

摘　　要：针对DMD数字光刻,利用ZEMAX光学设计软件,设计出了一套适用于型号0.7XGA DMD的10片式光刻投影物镜。该物镜采用非对称性结构,前组为改进的三分离物镜,后组为匹兹伐物镜加平像场镜,分辨率为2μm,近轴放大倍率为-0.15,像方数值孔径NA为0.158,全视场波像差小于λ/20,畸变小于0.014%,焦深为20μm,通过各项评价可知系统已经达到了衍射极限。在对该镜头进行公差分析后,利用Monte Carlo方法,模拟组装加工了100组镜头,得到90%的镜头MTF>0.46,50%的镜头MTF>0.51,证明了这种非对称性结构加工和校装的可能性。For the digital micromirror device （DMD） digital lithography, a ten-lenses projection objective was designed for DMD of model 0.7XGA by using Zemax optical design software. The projection objective uses the non-symmetrical structure, which has improved air-spaced triplet as front group and Petzval objective with flat field lens as back group, making it own higher resolution with 2 μm. Its paraxial magnification is -0.15,the image-side numerical aperture （NA） is 0. 158, the wavefront aberration is less than λ/20,the distortion is less than 0. 014% and focal depth is 20 9m. Through using Zemax to simulate, the system reaches dif- fraction limit theoretically. After tolerance analysis, by using Monte Carlo method, 100 groups of lenses were simulated for fabricating and assembling,results show that 90 % of them could realize MTF〉0.46 and 50% could realize MTF〉0. 51, which proves the possibility of fabricating and assembling such a non-symmetrical structure.

关 键 词：DMD数字光刻 光学设计 投影物镜 非对称式结构 

分 类 号：TN305.7[电子电信—物理电子学] TB851[一般工业技术—摄影技术]