1550nm陷波滤光片制备工艺技术研究  

Preparation technology of 1550 nm notch filter

作　　者：龚勋[1,2] 杭凌侠[1,2] 黄发彬 

机构地区：[1]西安工业大学,陕西西安710021 [2]陕西省薄膜技术与光学检测重点实验室,陕西西安710021

出　　处：《应用光学》2016年第1期118-123,共6页Journal of Applied Optics

摘　　要：陷波滤光片在抗激光损伤、激光防护和光电对抗领域应用广泛,如何提高其通带透过率,降低陷波点透过率是研究热点之一。基于Rugate理论设计了400nm^2 500nm波段1 550nm陷波滤光片,分析了Rugate折射率函数各参数对光谱性能的影响。采用PECVD技术在K9玻璃基底上镀制了单面的1 550nm陷波滤光片,通带的平均透过率达到88.54%,在1 550nm处的透过率为3.62%。Notch filter has been widely applied in laser damage resistance, laser protection and optoelectronic countermeasure fields, how to improve the passband transmittance and lower the notch transmittance is one of the hot research topics. A Rugate notch filter with a central wavelength of 1 550 nm was designed at the band of 400 nm-2 500 nm, a sensitivity analysis was undertaken in which several reflectance spectra were generated as a function of variations in the refractive index profile. Moreover,the designed filter was deposited on a single surface K9 substrate by plasma enhanced chemical vapor deposition （PECVD） technology. The experimental filter has 3.62% transmittance at 1 550 nm and 88.54% average transmittance at the pass band.

关 键 词：PECVD Rugate 陷波滤光片 

分 类 号：O484.4[理学—固体物理]