HFCVD法制备金刚石薄膜影响因素的研究进展  

Research Progress on Influencing Factors in the HFCVD Preparation of Diamond Films

作　　者：向耿辉 邸永江[1] 杨声平 杨号[1] 

机构地区：[1]重庆科技学院冶金与材料工程学院,重庆401331

出　　处：《广州化工》2016年第3期20-22,共3页GuangZhou Chemical Industry

基　　金：重庆科技学院2014大学生科技创新训练计划项目资助

摘　　要：金刚石薄膜由于其独特的性能成为研究热点。本文通过利用热丝气相沉积法(HFCVD)在基片上制备金刚石薄膜,研究对金刚石薄膜产生影响的各个因素,探讨各个影响因素的研究进展。基体表面预处理,可以提高基体的附着力,改善提高膜基结合力。通过改变甲烷和氢气浓度、沉积气压、温度等工艺参数,可影响是否能在基片上形成金刚石晶核,生成金刚石薄膜。通过对以上影响因素的研究进展,探讨制备过程各个最适宜的反应条件。Diamond film becomes research hot spot due to its distinct property. It was illustrated that the method of hot filament vapor deposition（ HFCVD） was used to make diamond film on the substrate,researching the factors which had influences on diamond film,and probing each influence factor＇s research progress. Substrate surface＇s pretreatment can enhance the adhesion of the substrate,and improve the adhesion between the film and the substrate. By changing the concentration of methane and hydrogen,deposition pressure,temperature and other parameters,these changes can affect whether the diamond crystal nucleus is formed on the substrate and further diamond film＇s generation or not. Based on researches to the factors above,the optimum reaction conditions on the preparation process were discussed.

关 键 词：热丝化学气相沉积 金刚石薄膜 表面预处理 基片温度 沉积气压 

分 类 号：TQ127.1[化学工程—无机化工]