射频ICP离子源设计研究  

Design of Radio Frequency Inductively Coupled Plasma Ion Source

作　　者：许沭华[1] 任兆杏[1] 沈克明[1] 翁坚[1] 

机构地区：[1]中国科学院等离子体物理研究所,安徽合肥230031

出　　处：《真空科学与技术》2002年第4期310-312,共3页Vacuum Science and Technology

摘　　要：本文介绍了射频 (RF)感应耦合等离子体 (ICP)离子源的设计研究。对RFICP的结构、离子流的引出以及离子流的均匀性、中性化和射频匹配网络进行了研究。A novel radio frequency inductive plasma coupled (ICP) ion source was successfully developed.The design principle and various aspects of the sources,including its structure,ion extraction,ion beam uniformity and matching network,were discussed and experimentally studied.Its potential applications were also discussed.

关 键 词：射频ICP 离子源 设计 射频匹配网络 感应耦合等离子体 离子流 均匀性 中性化 

分 类 号：O53[理学—等离子体物理]