CdTe清洁表面的微观平整性研究  

Investigation on Microcosmic Planeness of CdTe Clean Surface

作　　者：任洁[1] 傅莉[1] 白雪垠[1] 

机构地区：[1]西北工业大学材料学院,陕西西安710072

出　　处：《热加工工艺》2016年第8期183-186,共4页Hot Working Technology

摘　　要：采用氩离子刻蚀加退火获得了CdTe(111)A清洁表面。分析了角分辨光电子能谱和反射式高能电子衍射花样。结果表明:晶面经清洁处理后出现了局域台阶,而刻蚀力度局部的差别造成宏观不平整。另外,表面没有明显的三维凸起等不平整的原子结构,在二维尺度上平整有序。：A clean CdTe （111） A sttrface can be obtained by Ar ions sputtering and annealing. The angle-resolved photoemission spectroscopies （ARPES） and reflection high-energy electron diffraction （RHEEG） patterns were analyzed. The results show that local steps appear in crystal face after surface cleaning treatment, and the local differences of sputtering force contribute to the macroscopic unfairness. No unfaimess atomic structure, such as three-dimension lug, appears on the surface and it is planeness and well-ordered in two dimension.

关 键 词：氩离子刻蚀 局域台阶 原子有序性 平整性 

分 类 号：TG146.192[一般工业技术—材料科学与工程] TB302.1[金属学及工艺—金属材料]