PECVD技术制备多波段渐变减反膜  

Preparation of multi-band antireflection films with gradient refractive index by PECVD technology

作　　者：黄发彬 杭凌侠[1,2] 龚勋[1,2] 张笑[1,2] 

机构地区：[1]西安工业大学,西安710021 [2]陕西省薄膜技术与光学检测重点实验室,西安710021

出　　处：《光学技术》2016年第3期248-251,共4页Optical Technique

摘　　要：介绍了利用傅里叶变化法设计多波段渐变减反膜的原理和方法，研究了采用该方法设计多波段减反膜时Q函数的优选流程，给出了最优Q函数。设计优化得到了在350-5000nm波段范围平均透过率大于90％的多层渐变减反膜系结构，并采用等离子体增强化学气相沉积（PEcVD）技术完成了样片的制备。实验结果表明，镀制的样片在350～5000nm波段范围的平均透过率为90．55％，满足光谱特性的要求。The theory and method of designing multi-band antireflection films with gradient refractive index by Fourier transform is introduced. The selection process of optimal Q function in the course of designing multi-band antireflection films is studied. The optimal Q function is given and multilayer antireflection films structure with gradient refractive index that the average transmittance at a wavelength range of 350nm to 5000nm is greater than 90~ is achieved by design and optimization. Besides, the samples are deposited by plasma enhanced chemical vapor deposition （PECVD） technology. The experiment results show that the average transmittance of actually deposited samples at a wavelength range of 350nm to 5000nm is 90. 55%, which meets the design requirements.

关 键 词：PECVD 渐变折射率 多波段 减反膜 

分 类 号：O484.41[理学—固体物理]