电渗驱动纳米压印聚合物流变填充机理研究  

Polymer flow and filling behavior for electroosmosis-driven nanoimprint lithography

作　　者：宋晓[1] 兰红波[1] 田洪淼[2] 

机构地区：[1]青岛理工大学纳米制造与纳米电子实验室,青岛266033 [2]西安交通大学机械制造系统工程国家重点实验室,西安710049

出　　处：《中国科学：技术科学》2016年第6期615-624,共10页Scientia Sinica(Technologica)

基　　金：国家自然科学基金重大研究计划(批准号:91023023);国家自然科学基金(批准号:51375250);青岛市创业创新领军人才计划(批准号:13-CX-18)资助项目

摘　　要：电渗驱动纳米压印是一种新型的纳米压印工艺,它在大面积纳米压印、高深宽比微纳结构制造,尤其是在易碎衬底大面积图形化方面具有非常突出的潜能和优势.但是,电渗驱动纳米压印不同于现有的'压力驱动'纳米压印和'电毛细力驱动'纳米压印,已有的纳米压印聚合物流变填充基础理论和相关研究结果不再适用.本文开展了电渗驱动纳米压印聚合物流变填充机理、影响因素和规律的研究.基于微流体电渗驱动原理,建立了电渗驱动纳米压印驱动力体积力、填充速度以及填充时间的理论模型.利用COMSOL Multiphysics多物理场模拟软件,揭示了液态聚合物在模具型腔动态填充的过程,工艺参数、模具几何特征、聚合物材料特性等因素对于纳米压印流变填充的影响及其规律.本研究为电渗驱动纳米压印技术奠定了理论基础,并为电渗驱动纳米压印工艺优化和和压印装备开发与性能的改进提供了重要理论支撑和方向性指导.Electroosmosis-driven nanoimprint lithography（NIL） is an emerging nanopatterning approach which has shown great potential and unique strength in large-area nanoimprinting, fabricating high-aspect-ratio micro/nanostructures, patterning fragile substrates and non-flat surface. However, compared to the conventional pressure-driven NIL and the electrocapillary force-driven UV-imprinting, there is a big difference for such novel electroosmotic flow driven imprinting process. This paper investigated the mechanism, influencing factors and laws of polymer flow and filling behavior for the electroosmosis-driven nanoimprinting. Based on the principle of electroosmosis-driven micro flows, a theoretical model estimated body force was established. And the model of filling velocity and the model of filling time were derived. Furthermore, the dynamic filling process of electroosmosis-driven NIL, influence and laws of polymer flow and filling behavior regarding the imprint process parameters, the feature patterns and the properties of polymer were revealed by numerical simulation using COMSOL Multiphysics simulation software. These findings are valuable in providing a theoretical basis for electroosmosis-driven nanoimprinting, optimizing imprinting process and further enhancing the performance of the new patterning method.

关 键 词：纳米压印 电渗驱动 电渗流 流变填充 微纳制造 

分 类 号：TN305.7[电子电信—物理电子学]