Ag/BaTiO_3薄膜的激光刻蚀电极图案制备及性能研究  

Preparation of Ag/BaTiO_3 Thin Film Electrode Pattern by Laser Ablation

作　　者：王盼[1] 徐华蕊[1] 朱归胜[1,2] 李瑾瑾[1] 付振哓 余艾冰[4] 

机构地区：[1]桂林电子科技大学材料学院,广西桂林541004 [2]电子科技大学微电子与固体电子学院,四川成都610054 [3]新型电子元器件关键材料与工艺国家重点实验室广东风华高新科技股份有限公司,广东肇庆526020 [4]莫纳什大学化学工程系

出　　处：《应用激光》2016年第4期428-433,共6页Applied Laser

基　　金：国家自然科学基金资助项目(项目编号:61540073);中国博士后科学基金资助项目;广西信息材料重点实验室基金资助项目(项目编号:161014-Z);广西科学研究与技术开发计划资助项目(项目编号:桂科攻1598007-9);中国航天科技集团公司航天科技创新基金资助项目(项目编号:KJ2014-006)

摘　　要：采用激光刻蚀实现了BaTiO_3薄膜上溅射Ag金属薄膜电极的图案化,并对激光刻蚀功率、激光刻蚀线间距以及点间距对图案微槽深度、刻蚀边缘整齐度和对底层BaTiO_3的影响进行了研究。结果表明,图案刻蚀边缘整齐度随刻蚀功率先增大后减小,激光刻蚀功率为12 W时达到最优值,薄膜电极图案随刻蚀线间距以及点间距减小而刻蚀更加充分,在刻蚀线间距以及点间距达到0.03mm时可以获得具有理想刻蚀精度的图案,且对BaTiO_3薄膜未造成损伤,为MLCC等薄膜电容器的低成本快速制备提供了一种新的思路。In this paper, a method of making the BaTiO3 film sputtering Ag metal film electrode pattern by laser ablation was introduced. The effect of laser ablation power, line spacing, point spacing and laser ablation times on micro groove depth, edge etching uniformity and the underlying EaTiO3 were studied. The results show that with the increase of laser ablation output power, the uniformity of pattern edge firstly increases and then decreases, and the uniformity becOme best when the laser ablation power is 12 W. As the line spacing and point spacing get smaller, the pattern of electrode film to become full. When they reach 0.03 mm, ablation pattern with ideal precision can be obtained, and there is no damage to BaTiO3 film. A new thought of film capacitor which can be prepared fast with lower cost, such as multilayer ceramic capacitors （MLCC） is offered.

关 键 词：MLCC 激光刻蚀 图案化 

分 类 号：TG485[金属学及工艺—焊接]