退火对金属介质多层膜的界面扩散及抗化学清洗性能的影响  

Influence of Annealing on Interface Diffusion and Anti-Chemica-Cleaning Property of Metal-Dielectric Multilayer Films

作　　者：张洪[1,2] 晋云霞[2] 孔钒宇[2] 黄昊鹏[1,2] 崔云[2] 胡国行[2] 李响潭 葛雯娜 叶邦角[3] Zhang Hong Jin Yunxia Kong Fanyu Huang Haopeng Cui Yun Hu Guoxing Li Xiangtan Ge Wenna Ye Bangjiao(University of Chinese Academy of Sciences, Beijing 100049, China Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences, Shanghai 201800, China State Key Laboratory of Particle Detection and Electronics, Department of Modern Physics, University of Science and Technology o f China. Hefbi 230026. China)

机构地区：[1]中国科学院大学,北京100049 [2]中国科学院上海光学精密机械研究所强激光材料重点实验室,上海201800 [3]中国科学技术大学近代物理系核探测与核电子学国家重点实验室,合肥230026

出　　处：《中国激光》2016年第10期133-139,共7页Chinese Journal of Lasers

基　　金：国家自然科学基金(61405225;61405219)

摘　　要：对金属介质多层膜样品进行不同温度的退火处理。实验发现,当退火温度为350℃时,在样品Au层与SiO_2层的界面处出现过渡层,样品具有很强的抗化学清洗能力。利用透射电子显微镜观测与能谱仪分析发现,过渡层的出现主要是Cr原子从Au层底部扩散到SiO_2层的结果。过渡层可以增强Au层与SiO_2层间的粘附力,阻挡酸溶液的渗入,使得金属介质多层膜的抗化学清洗能力得到增强。Samples of metal-dielectric multilayer films are post-annealed at different temperatures. It is experimentally found that at the annealing temperature of 350 ℃, a transition layer between Au layer and SiO2 layer of the samples occurs, and these samples possess the strong anti-chemical-cleaning ability. Based on the investigation by a transmission electron microscope and the analysis by an energy dispersive spectrometer, it is found that the occurrence of transition layers is mainly the result of Cr atoms diffusing from the Au bottom layer to the SiO2 layer. The transition layer can enhance the adhesion between the Au layer and SiO2 layer and block the infiltration of acid solutions, thus the anti-chemical-cleaning ability of metal-dielectric multilayer films is enhanced.

关 键 词：材料 界面扩散 化学清洗 退火 粘附力 

分 类 号：O436[机械工程—光学工程]