射频磁控溅射方法制备掺氮TiO_x薄膜及其结构和亲水性研究（英文）  

Structural and Hydrophilic Characteristics of N-doped TiO_x Films Deposited by RF-Magnetron Sputtering

作　　者：程春玉[1] 蔺增[1,2] 王妨[1] 李慕勤[2] 

机构地区：[1]东北大学,辽宁沈阳110819 [2]佳木斯大学,黑龙江佳木斯154007

出　　处：《稀有金属材料与工程》2016年第9期2232-2236,共5页Rare Metal Materials and Engineering

基　　金：A Grant from Shenyang City(F13-295-1-00);Fundamental Research Funds for the Central Universities(N130403002)

摘　　要：采用磁控溅射方法制备掺氮TiOx薄膜。将TiOx作为靶材,通以N2/Ar混合气体来精确控制N的掺杂量。为改善掺氮TiOx薄膜的性能,首先将试样放于退火炉中退火,退火温度范围为300～600℃;再将试样放于黑暗处一段时间;最后用可见光（VIS）照射。采用扫描电子显微镜（SEM）观察薄膜的表面形貌,结果表明,颗粒尺寸随退火温度升高而增大。采用X射线光电子能谱（XPS）研究薄膜的化学成分,结果表明,薄膜中生成了N-Ti-O（β-N）和羟基,这可能是因为N掺杂入TiOx晶格引起的;且羟基含量随退火温度升高而增加,使得基片有更好的亲水性。采用X射线衍射（XRD）研究薄膜的晶体结构,结果表明,退火后非晶薄膜转变为晶态。采用接触角仪测试薄膜的亲水性,结果表明,水接触角随退火温度升高而减小,这可能是由于颗粒尺寸和羟基含量的改变造成的。亲水性也受避光储存时间的影响,实验结果表明,随着储存时间的增加,水接触角增加。可见光照射实验表明,可见光照射后薄膜的亲水性增加。Nitrogen doped titanium oxides（N-doped TiOx） films were deposited by sputtering the TiO2 target in N2/Ar gas mixture to control the doping amount of nitrogen accurately. In order to modify the resultant films, the samples were annealed in air in a temperature range of 300 ～ 600 ℃, and then they were irradiated under visible-light（VIS） after being placed in dark. X-ray photoelectron spectroscopy（XPS） spectra show that N-Ti-O（β-N） and hydroxyl form in the films due to nitrogen doped into TiOx lattice. And the content of hydroxyl increases with annealing temperatures increasing, which leads to the better hydrophilicity. X-ray diffraction（XRD） was used to investigate the crystallinity of the films annealed at different temperatures and the results indicate that the amorphous films transform into crystalline phase as a consequence of annealing. Scanning electron microscopy（SEM） results reveal that the particle size becomes bigger at the higher temperature. Hydrophilicity was tested by contact angle meter. The results show that the water contact angle decreases with raising heat treatment temperature due to the change of particle size and the content of –OH. Hydrophilicity is also influenced by the storing process, and the water contact angles increase with time. Furthermore, the hydrophilicity of N-doped TiOx films increases under visible light（VIS） irradiation.

关 键 词：掺氮TiO2薄膜 磁控溅射 退火 亲水性 

分 类 号：TB383.2[一般工业技术—材料科学与工程]