ArF准分子激光系统的能量效率特性  

Energy efficiency analysis of ArF excimer laser system

作　　者：王倩[1,2,3] 赵江山[1,2] 罗时文[4] 左都罗[4] 周翊[1,2] 

机构地区：[1]中国科学院光电研究院,北京100094 [2]北京市准分子激光工程技术研究中心,北京100094 [3]中国科学院大学,北京100049 [4]华中科技大学,武汉光电国家实验室,武汉430074

出　　处：《物理学报》2016年第21期153-160,共8页Acta Physica Sinica

基　　金：中国科学院光电研究院创新基金(批准号:Y50B16A12Y);国家科技重大专项(批准号:2013ZX02202)资助的课题~~

摘　　要：为深入理解ArF准分子激光系统的运转机制,进而获得优化ArF准分子激光系统设计的理论及方向性指导,利用一维流体模型,以气体高压放电等离子体深紫外激光辐射过程为主要对象,研究了放电抽运ArF准分子激光系统的动力学特性,梳理了ArF准分子激光系统的能量传递过程,深入研究了等离子体放电机理,从能量沉积效率、ArF*粒子形成过程、激光输出三个方面,分析了动力学过程中影响能量效率的主要因素,提出了相应的改进优化措施.仿真结果表明,氟气及相关粒子在系统运转过程中有重要作用,工作气体中氟气的组分比例对能量效率影响较大,偏离最佳点会导致激光系统能量效率的下降.相关结论为ArF准分子激光系统的优化设计和稳定可靠运转提供了重要的理论参考依据.The reliable functioning and continual optimizing of ArF excimer laser system is of importance when it comes to productization into the market from a laboratory test machine. The analysis of dynamic characteristics of the system is vital to understanding its operating mechanism and optimizing the design theoretically. In this article, one-dimensional fluid model is used to analyze the excimer laser discharge mechanism, and the content ratio of fluorine gas, argon gas, and neon gas, which constitute a gas mixture, is studied in a simulated ArF excimer laser system. Particles are treated as a fluid, which significantly reduces the computing cost in fluid model, and therefore is suitable for high-pressure situation.Four equations are included in one-dimensional fluid model, i.e., Boltzmann equation that describes electron energy distribution, ion continue equation that illustrates ion number density, Poisson＇s equation that shows the distribution of electric field, and photon rate equation that demonstrates laser outputting process. By combining these four equations,high pressure plasma discharge process and particles stimulated radiation process are studied, and calculation continues from one time step to another until the end of discharging process. The result of the calculation presents energy transfer process from three aspects： energy deposition efficiency, ArF＊ formation, and laser outputting. In the energy deposition process, the energy deposition efficiency is sensitive to the change of fluorine gas ratio while the variation of the content ratio of other two gases has a less influence on this process. In addition, there exists an optimal fluorine gas ratio that causes the highest energy deposition efficiency. In the ArF＊ formation process, the reaction between excited argon ions and fluorine gas is the main channel that generates ArF＊. The proper increasing of fluorine gas ratio helps form ArF＊.In the laser outputting process, photon loss is mainly because of the reaction between fluorine negativ

关 键 词：ArF准分子激光 能量效率 流体模型 电子密度 

分 类 号：TN24[电子电信—物理电子学]