磁控溅射法制备IGZO薄膜材料技术的研究进展  

Research Progress of IGZO Film Material Technology Prepared by Magnetron Sputtering Method

作　　者：张力[1] 杨钊[1] 郗雨林[1] 王政红[1] 

机构地区：[1]洛阳船舶材料研究所,河南洛阳471023

出　　处：《热加工工艺》2016年第22期16-18,23,共4页Hot Working Technology

摘　　要：IGZO TFT具有载流子迁移率高、可见光透过率高、大面积均匀性良好、低功耗等优点,成为显示器朝着大尺寸、柔性化方向发展最具潜力的新型背板技术。综述了IGZO材料的特性和应用,总结出IGZO薄膜的制备方法,同时提出了IGZO靶材的性能要求和关键技术,可为IGZO靶材的研究及产业化提供借鉴。Due to its high carrier mobility, high light transmittance, large area uniformity and low power consumption characteristics, IGZO TFT was considered to be the most promising new backplane technology for the development of large size and flexible display panels. The properties and applications of IGZO material were reviewed, and the preparation methods of IGZO film were summarized. Furthermore, the property requirements and key fabrication technologies of IGZO target are put forward, which can can provide reference for the research and industrialization of IGZO target.

关 键 词：IGZO 溅射靶材 光电薄膜 制备技术 

分 类 号：TN304.21[电子电信—物理电子学]