溶液沉积平整化工艺用于制备第二代高温超导带材的研究进展  

Second Generation High Temperature Superconducting Tapes Prepared by Solution Deposition Planarization Process:A Review

作　　者：储静远 赵跃[1] 吴蔚[1] 洪智勇[1] 金之俭[1] 

机构地区：[1]上海交通大学电子信息与电气学院,上海200240

出　　处：《材料导报》2016年第23期109-113,共5页Materials Reports

基　　金：国家自然科学基金青年项目(51502171)

摘　　要：低成本制备高性能第二代高温超导带材是实现其产业应用的基础。离子束辅助沉积技术由于具有对金属基带材料依赖弱、产生的织构度高、生产速度快等优点而被广泛使用。在该工艺中,如何获得原子级平整的金属基底,进而获取优良织构的缓冲层一直是科学家关注的焦点。近年来,溶液沉积平整化(SDP)作为一种新型的基底平整化处理方式,以其特有的成本低廉、生产高效等优势越来越被各国所重视。系统地介绍了SDP工艺的发展历史和基本原理,总结了近几年来国内外科研机构对SDP工艺研究的主要内容及最新进展。Fabrication of low-cost second generation high temperature superconducting tapes with high-per- formance is the foundation of industrial application. Among all the fabrication routes, ion beam assisted deposition has been widely used due to its weak dependence on materials of mentallic substrate, high aligned texture formation, high throughput and so on. In this process, obtaining atomically flat metal substrate and the formation of excellent textured buffer layer are the key points. Solution deposition planarization （SDP）, as a new route to planarize the substrate, has attracted more and more attention over the world because of the low-cost, high throughput and other typical advanta-ges. This paper briefly reviews the history and the principles of the SDP technique, and highlight the latest research achievements of SDP at home and abroad.

关 键 词：第二代高温超导带材 薄膜生长 溶液沉积平整化 离子束辅助沉积 

分 类 号：TB34[一般工业技术—材料科学与工程]