TiAlN薄膜掺杂Cr、Ni对其耐腐蚀性的影响  

Effect of Cr and Ni doping on corrosion resistance of TiAlN film

作　　者：朱文波[1] 高原[1] 王成磊[1] 何胜军[1] 

机构地区：[1]桂林电子科技大学材料科学与工程学院,广西桂林541004

出　　处：《材料热处理学报》2016年第12期167-172,共6页Transactions of Materials and Heat Treatment

基　　金：国家自然科学基金资助项目(51264007);桂电-桂林电科院研究生资助项目(20141103-09-Z);广西信息材料重点实验室重点项目(1210908-214-Z);广西自然科学基金资助项目(2015GXNSFBA139214);桂林电子科技大学研究生教育创新计划资助项目(YJCXB201501)

摘　　要：在4Cr13不锈钢表面采用多弧离子镀沉积TiAlN薄膜,采用磁控溅射法和多弧离子镀在4Cr13表面分别沉积掺杂Cr和Cr、Ni的TiAlN薄膜,采用电化学工作站对其进行电化学腐蚀性能测试。结果表明:在1 mol/L的H_2SO_4溶液中,同时掺杂Cr、Ni的TiAlN薄膜的耐腐蚀性是TiAlN薄膜的4.1倍,是掺杂Cr的TiAlN薄膜的1.3倍;在3%的NaOH溶液中,同时掺杂Cr、Ni的TiAlN薄膜的耐腐蚀性是TiAlN薄膜的3倍,是掺杂Cr的TiAlN薄膜的2倍;在3.5%的Na Cl溶液中,同时掺杂Cr、Ni的TiAlN薄膜的耐腐蚀性是TiAlN薄膜的11.4倍,是掺杂Cr的TiAlN薄膜的1.3倍。TiAlN thin film was deposited on 4Cr13 stainless steel surface by multi arc ion plating,and TiAlN thin films doped with Cr and Cr Ni were prepared on the surface of 4Cr13 stainless steel by magnetron sputtering and multi arc ion plating. Electrochemical corrosion performance of the films was tested on an electrochemical workstation. The results show that in 1 mol/L H_2SO_4 solution,the corrosion resistance of the TiAlN film doped with Cr and Ni is 4. 1 times of that of the TiAlN thin film,and is 1. 3 times of that of the TiAlN thin film doped with Cr; in 3% NaOH solution,the corrosion resistance of the TiAlN film doped with Cr and Ni is 3 times of that of the TiAlN thin film,and is 2 times of that of the TiAlN thin film doped with Cr; in 3. 5% Na Cl solution,the corrosion resistance of the TiAlN film doped with Cr and Ni is 11. 4 times of that of the TiAlN thin film,and is 1. 3 times of that of the TiAlN thin film doped with Cr.

关 键 词：不锈钢 TIALN薄膜 多弧离子镀 磁控溅射 腐蚀 

分 类 号：TG174.44[金属学及工艺—金属表面处理]