准分子激光与SiC陶瓷的相互作用研究  

Interaction Between Excimer Laser and SiC Ceramic

作　　者：罗艳[1,2] 吴晓斌[1,2] 周翊[1,2] 王宇[1,2] 

机构地区：[1]中国科学院光电研究院,北京100094 [2]北京市准分子激光工程技术研究中心,北京100094

出　　处：《激光与光电子学进展》2016年第12期159-164,共6页Laser & Optoelectronics Progress

基　　金：国家科技重大专项(2012ZX02702001)

摘　　要：采用准分子激光对SiC陶瓷表面进行了不同脉冲数、不同单脉冲能量和不同重复频率的辐照实验,获得了SiC陶瓷的辐照损伤二维和三维表面形貌,并分析了微观作用机制。结果表明,193nm准分子激光辐照SiC陶瓷时既产生光热作用又产生光化学作用,其中光热作用占主导;SiC表面损伤的宏观形貌与激光辐照参数相关,辐照脉冲数增加或单脉冲能量增加均会加重辐照损伤,增大激光重复频率会导致辐照损伤深度略微下降。Irradiation experiments are conducted on the number, single-pulse energy, and repetition frequency SiC ceramic using excimer lasers with different pulse The two-dimensional and three-dimensional damage morphologies of irradiation-damaged SiC ceramic are acquired, and the microscopic damage mechanism is analyzed. The results indicate that, with 193 nm excimer laser irradiating on SiC ceramic, both the photo-thermal and photo- chemical effects are involved and the photo-thermal effect is dominant. The macroscopic damage morphology is closely related to laser irradiation parameters and the increment of either the irradiation pulse number or single-pulse energy aggravates the irradiation damage. Increasing the laser repetition frequency results in a little reduction of scratch depth.

关 键 词：激光技术 辐照损伤 损伤机制 准分子激光 SIC陶瓷 

分 类 号：TN23[电子电信—物理电子学] O439[机械工程—光学工程]