半球陀螺金属化膜层的均匀性模拟分析  

Simulation Analysis of the Uniformity of Hemispherical Resonator Gyroscope's Metallic Film

作　　者：贺海平[1] 蒋春桥[1] 李陟[1] 

机构地区：[1]中国电子科技集团公司第二十六研究所,重庆400060

出　　处：《压电与声光》2016年第6期938-941,946,共5页Piezoelectrics & Acoustooptics

基　　金：重点预研基金资助项目(9140A09012015DZ36025)

摘　　要：该文将光学模拟技术与镀膜工艺结合,采用光线追踪程序来模拟溅射粒子在振子表面膜层的分布状态。通过模拟和相关实验验证,当设备相对角度β=10°、φ=60°时,振子表面膜层的均匀性最高,模拟值与实际测试值匹配度较好,误差在7%以内。In this research, we combined the optical simulation with the coating film process to simulate the sputtering particle distribution state of hemispherical resonator＇s film by the ray trace procedure. The simulation and relevant experimental results show that the optimal film uniformity can be received when the relative angle β= 10°,φ= 60°. The simulation value is well matched with the actual test value, and the error rate is less than 7%.

关 键 词：半球谐振陀螺 金属化 镀膜 模拟 均匀性 

分 类 号：O766[理学—晶体学]