基于DMD光刻制作微柱透镜阵列分模曝光的研究  

Novel Multiple Exposure in Fabrication of Micro Hemi-cylindrical Lens Array by Digital Micro Mirror Lithography

作　　者：张恒煦 董连和[1] 王丽[1] 孙艳军[1] 冷雁冰[1] 吴博琦 李哲[1] 刘顺瑞 

机构地区：[1]长春理工大学光电工程学院,长春130022

出　　处：《真空科学与技术学报》2016年第12期1441-1445,共5页Chinese Journal of Vacuum Science and Technology

摘　　要：针对无掩模光刻技术制作微柱透镜阵列的面形精度问题,对曝光方式和掩模设计进行研究,采用一种分模曝光方法,包括图形分层,掩模设计,分层掩模灰度调制,分层曝光四个步骤。在曝光前,需要对二维掩模版图按设计结构高度进行分层,以实现单层掩模在抗蚀剂上的投影成像高度不超过物镜的焦深范围。基于数字微镜阵列对灰度掩模的空间调制原理,设计出匹配的分层掩模版图,给出了图形分层原则和方法以及模板设计的原理。实验结果表明:采用该方法制作微柱透镜阵列,面形平均误差为0.54μm,相比以往单模曝光平均误差值0.79μm,平均误差减小了0.25μm,该方法弥补了由物镜焦深限制所造成的技术问题,提高了曝光质量。A novel multiple-exposure technique was developedto improve the quality ofhemi-cylindrical micro lens array, fabricated by digital micro-mirror （DMD） , mask-less lithography. The newly-developed multiple exposure includes 4 major steps：graphic segmentation, mask stratification, layered mask grayscale modulation and layered mask exposure. First, the 2D mask was stratified in such a way that the image height projected of a single layer mask on the resist lied within the objective lens focusing range. Next ,the matching layered mask was designed ,based on DMD spatial modulation principle for gray scale mask. Finally, the cylindrical micro lens array, fabricated by the new multiple exposure, was experimentally evaluated. The results show that the multiple exposure significantly out- performs the conventional single exposure. For example, the average surface-shape error was 0. 54 μm, 0. 25 μm lower than 0.79 μm of the conventional single mode exposure.

关 键 词：无掩模光刻 数字微镜 灰度掩模 微柱透镜阵列 分模曝光 

分 类 号：O436.1[机械工程—光学工程]