后处理对HfO_2薄膜光学特性及抗激光损伤阈值的影响  

Effects of posttreatments on optical properties and laser induced damage thresholds of HfO_2 thin films

作　　者：吴倩[1] 罗晋[1] 潘峰[1] 

机构地区：[1]成都精密光学工程研究中心,四川成都610000

出　　处：《光学精密工程》2016年第12期3000-3004,共5页Optics and Precision Engineering

基　　金：基金项目:大口径宽带低色散高阈值膜研制(No.2015AA8044064)

摘　　要：利用电子束蒸发技术制备了氧化铪薄膜,并分别用氧气氛下退火和激光预处理两种后处理方法对样品进行了处理。介绍了两种后处理工艺和相关的设备,测试分析了样品的透过率、吸收和抗激光损伤阈值。对比了两种后处理方法对降低吸收和提高激光损伤阈值的效果,讨论了它们的作用原理。实验结果表明,激光预处理能有效降低样品的吸收值,提高样品的抗激光损伤阈值。采用一步法(50%初始损伤阈值)预处理后,三倍频氧化铪薄膜的损伤阈值从13J/cm^2提升到15J/cm^2;采用两步法(依次50%、80%初始损伤阈值)预处理后,三倍频氧化铪薄膜的损伤阈值从13J/cm^2提升到17.5J/cm^2,损伤几率曲线整体向高通量区域平移。HfO2 thin films were prepared by electron beam evaporation technique. Two kinds of post- treatment methods, anneal in oxygen and laser treatment, were employed to treat the samples under the oxygen condition. The procedures of post-treatment and corresponding treatment equipment were introduce and the optical transmittance, absorption and laser induced damage threshold of a HfO2 thin film sample at 355 nm were measured before and after the treatments. The treatment results on reduc- ing absorption and improving the LIDT by above two post-treatment methods were compared, and their working principles were discussed. The experiments demonstrate that laser treatment decreases the sample absorption and improves the LIDT of HfO2 thin films. With one step（50~ LIDT）, the LIDT of the HfO2 film at 355 nm increases from 13 J/cm2 to 15 J/cm2. With two steps（50% LIDT and 80% LIDT ）, the LIDT of the HfO2 film at 355 nm increases from 13 J/cm2 to 17.5 J/cm2, and the damage probability curve translates to a high flux area wholly.

关 键 词：HFO2薄膜 镀膜技术 后处理 薄膜参数测量 薄膜光学特性 激光损伤阈值 

分 类 号：O484.41[理学—固体物理]