浅析7nm之后的工艺制程的实现  

Analysis of 7 nm After the Process of the Realization of the Process

作　　者：Mark LaPedus 

机构地区：[1]EETimes半导体工程制造,美国

出　　处：《集成电路应用》2017年第1期50-53,共4页Application of IC

摘　　要：近来,Global Foundries宣布将会推进7 nm Fin FET工艺,引发了行业对工艺节点、光刻等技术的探讨。这是是来自Semi Engineering年的一篇报道,带领大家了解7 nm工艺及以后的半导体业界的发展方向。Recently, GlobalFoundries announced that it will promote the FinFET 7nm process, causing the industry to process node, lithography and other technologies. This is a report from SemiEngineering, led us to understand the development direction of the 7rim technology and the future of the semiconductor industry.

关 键 词：集成电路制造 7nm FINFET GLOBALFOUNDRIES 

分 类 号：TN405[电子电信—微电子学与固体电子学]