supported by the National Natural Science Foundation of China (623B2028).
The advanced fin-shaped field-effect transistor(FinFET)technology offers higher integration density and stronger channel control capabilities,however,more complex process effects are also introduced which have signifi...
financially supported by the Science and Technology Program of Beijing Municipal Science and Technology Commission (No.Z201100006820084);the National Natural Science Foundation of China (Nos.92064003,91964202 and 61904194);the Youth Innovation Promotion Association,Chinese Academy of Sciences under grant (Nos.2023130 and Y9YQ01R004)。
In this work,a conventional HfO_(2) gate dielectric layer is replaced with a 3-nm ferroelectric(Fe) HZO layer in the gate stacks of advanced fin field-effect transistors(FinFETs).Fe-induced characteristics,e.g.,negati...
This manuscript explores the behavior of a junctionless tri-gate FinFET at the nano-scale region using SiGe material for the channel.For the analysis,three different channel structures are used:(a)tri-layer stack chan...