液动压悬浮抛光机床的设计与研究  

Research and design of hydrodynamic suspension polishing machine

作　　者：章少杰[1] 陈珍珍[1] 文东辉[1] 尹林志[1] 

机构地区：[1]浙江工业大学机械工程学院,浙江杭州310014

出　　处：《制造技术与机床》2017年第1期128-132,共5页Manufacturing Technology & Machine Tool

基　　金：国家自然科学基金(51375457);浙江省自然科学基金(Y14E050057);浙江省自然科学基金一般项目(LY16E050013)

摘　　要：为了解决纳米薄膜生长所需的原子级超光滑表面制备问题,基于液动压悬浮抛光新方法开展液动压悬浮抛光机床的设计研究。利用铝基盘作上抛光盘,高磷合金铸铁盘作下抛光盘,抛光工件贴于上抛光盘上,上下抛光盘保持一定的间隙并浸没在抛光液中,结合高精度的滚珠花键轴和导轨即可实现新型的非接触式抛光—液动压悬浮抛光。In order to solve the problem of the preparation of atomically ultra-smooth surface which was used for nanofilm growth,a hydrodynamic suspension polishing machine based on a new method of hydrodynamic suspension polishing suspension was designed.Use of aluminum plate as top polishing plate,high-phosphorus iron alloy plate as follow polishing plate,polished workpieces pasted on the top polishing plate,maintain a certain gap between the top and follow polishing plates maintain a certain gap and immersed in a polishing liquid,combined with high-precision ball spline shaft and guides can achieve the new non-contact polishing-hydrodynamic suspension polishing.

关 键 词：超光滑表面 液动压悬浮 抛光盘 非接触式 

分 类 号：TG502[金属学及工艺—金属切削加工及机床]