磁控溅射法制备五氧化二钒薄膜的表面粗糙度研究  

Study on Surface Roughness of V_2 O_5 Films Prepared by Magnetron Sputtering

作　　者：张吴晖 卢文壮[1,2] 杨斌[1] 杨凯[1] 杨旭[1] 

机构地区：[1]南京航空航天大学机电学院,南京210016 [2]江苏省精密与微细制造技术重点实验室,南京210016

出　　处：《航空兵器》2017年第2期60-64,共5页Aero Weaponry

基　　金：航空科学基金项目(20140152001);南京航空航天大学研究生创新基地(实验室)开放基金(kfjj20150507)

摘　　要：V_2O_5是一种具有热致相变特性的新型非线性光学材料,被广泛应用于激光致盲防护领域。V_2O_5薄膜的表面粗糙度是影响其性能的重要因素。本文采用磁控溅射镀膜的方法在蓝宝石表面制备V_2O_5薄膜,通过控制氧氩比以及衬底温度,探究V_2O_5薄膜表面粗糙度与这两个因素之间的关系。实验表明,衬底温度较低(约300℃)时,表面粗糙度较小,且随氧含量变化不大;衬底温度较高(400℃以上)时,随着氧含量的增加,表面粗糙度变大。同时,当氧分压一定时,随着衬底温度的提高,薄膜的表面粗糙度也增大。The vanadic pentoxide （ V2O5 ） film is a new nonlinear transparence material with thermal induced phase transition, which is widely used in the field of blinding laser protection. The surface rough-ness of V2O5 thin films is an important factor affecting its performance. Magnetron sputtering deposition is used for preparation of V2O5 films on sapphire substrates. By controlling oxygen-argon ratio and substrate temperature,the relationships between surface roughness and these two factors are revealed. The results indicate that when substrate temperature is low（ about 3 0 0 ℃ ） ,the surface roughness is low and not high-ly correlated to oxygen content. In contrast, when substrate temperature is relatively high （ higher than 400 ℃ ）,the surface roughness is higher with the increase of oxygen content. Moreover,with the constant oxygen content and higher substrate temperature,the surface roughness is higher.

关 键 词：磁控溅射 氧氩比 衬底温度 V2O5薄膜 表面粗糙度 激光防护技术 

分 类 号：TJ760.5[兵器科学与技术—武器系统与运用工程] TN213[电子电信—物理电子学]