光刻照明系统中复眼透镜的设计及公差分析  

Design and tolerance analysis of compound eye lens in lithography lighting system

作　　者：李美萱[1,2] 王美娇[2] 王丽[1] 冷雁冰[1] 董连和[1] 

机构地区：[1]长春理工大学,吉林长春130022 [2]长春理工大学光电信息学院,吉林长春130012

出　　处：《激光与红外》2017年第7期842-847,共6页Laser & Infrared

基　　金：国家自然科学基金项目(No.91338116;No.11474037)资肋

摘　　要：在超大规模集成电路中,为了实现NA=1.35,波长193 nm处分辨率达到45 nm的目标,需要对影响光刻照明均匀性的误差源进行详细分析最终确定公差范围。复眼透镜是使光束在系统掩膜面上形成矩形均匀照明区域的关键元件。采用CODE V软件设计了复眼透镜对引起照明不均匀性的因素进行分析,结合复眼透镜组的设计方案和实际加工能力,给出X和Y向复眼曲率公差为±10%,后组曲率公差为±5%,前后组间隔公差为±50μm,位置精度偏心公差为±1μm,装配精度公差为±3μm。制定公差合理、可行,满足了浸没式光刻照明系统高均匀性、高能量利用率的要求。In order to distinguish 45 nm target in the very large scale integrated circuit where the numerical aperture is 1.35 and its wavelength is 193 nm,it is necessary to analyze the error factors which affects lithography lighting uniformity,and eventually the tolerance range can be determined. Since the compound eye lens can make the light beam form rectangular uniform illumination area on the surface of mask, it is a key component in the lighting system. Through CODE V software,compound eye lens is designed,and the illumination non-uniformity is simulated and analyzed. Considering the compound eye lens design and actual processing,it is concluded that x-direct and y-direct compound eye curvature tolerance is ±10% ,the back-group curvature tolerance is ±5% ,the interval tolerance between front and back group is ±50 μm,the location accuracy of eccentric tolerance is ±1 μm,the assembly accuracy tolerance is ± 3 μm. The results show that the tolerances are reasonable and feasible and can meet the requirements of high uniformity and high energy utilization of immersion lithography lighting system.

关 键 词：浸没式光刻 高均匀性照明 分辨率 光学设计 公差分析 

分 类 号：O439[机械工程—光学工程]