基材温度对磁控溅射制备的Ti-Al-Si-Cu-N涂层的微观结构及摩擦学性能的影响（英文）  

Effects of Substrate Temperature on Microstructure and Tribological Properties of Ti-Al-Si-Cu-N Films Deposited by Magnetron Sputtering

作　　者：冯长杰[1] 陈恩[1] 

机构地区：[1]南昌航空大学,江西南昌330063

出　　处：《稀有金属材料与工程》2017年第6期1497-1502,共6页Rare Metal Materials and Engineering

基　　金：National Natural Science Foundation of China(51005111,51365041)

摘　　要：采用反应磁控溅射技术在304不锈钢基片上沉积Ti-Al-Si-Cu-N涂层。通过扫描电镜(SEM)、能谱仪(EDS)、X射线衍射仪(XRD)、纳米压痕仪、划痕仪和球盘式摩擦磨损试验机研究了不同基材温度(沉积温度)对涂层结构和摩擦学性能的影响。结果表明:随着沉积温度从室温升至250℃,涂层表面变得平滑,结构致密。硬度和弹性模量随沉积温度的升高而升高。划痕试验表明:当沉积温度分别为室温,150和250℃时,临界载荷为3.85,3.45和5.10 N。当沉积温度为250℃时,涂层的摩擦系数和磨损速率最小,摩擦过程中产生的磨屑主要来自GCr15不锈钢珠。在较低的沉积温度下,涂层的磨损机理主要为疲劳断裂和磨粒磨损,而250℃沉积的涂层的磨损机制主要为磨粒磨损。Ti-Al-Si-Cu-N films were deposited on the AISI-304 stainless steel by reactive magnetron sputtering technology.The influences of the substrate temperature（deposition temperature） on the microstructure and properties of the films were researched by scanning electron microscope（SEM）,energy disperse spectroscopy（EDS）,X-ray diffraction（XRD）,a nano-indenter,a scratch tester and a ball-on-disc rotational tribometer.The results indicate that when the deposition temperature increases from room temperature to 250 oC,the films become smoother and denser.The hardness and elastic modulus increase with the increase of the deposition temperature.The scratch tests show that when the deposition temperature is RT,150 and 250 oC,the critical load of the films is 3.85,3.45 and 5.10 N,respectively.The friction coefficient and wear rate of the Ti-Al-Si-Cu-N film deposited at 250 oC are the smallest,and the wear debris is mainly from the counterparts GCr15 stainless steel balls,The wear mechanism of the films deposited at lower temperatures is mainly fatigue fracture and abrasive wear,while that of the film deposited at 250 oC is abrasive wear.

关 键 词：反应磁控溅射 Ti-Al-Si-Cu-N涂层 沉积温度 磨损机理 

分 类 号：TG174.4[金属学及工艺—金属表面处理]