光刻机光强影响因素分析  

The Influence Factors Analysis of Mask Aligner's Exposure Intensity

作　　者：孙明睿[1] 李雪[1] 甄万财[1] SUN Mingrui LI Xue ZHEN Wancai(The 45th Research Institute of CETC, Beijing 100176, China)

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176

出　　处：《电子工业专用设备》2017年第5期18-21,共4页Equipment for Electronic Products Manufacturing

摘　　要：曝光系统是接触接近式光刻机的核心部件,系统的曝光强度对光刻工艺有很大的影响。通过对曝光光路系统进行详细分析,对影响光强的各种因素进行了论述和计算,为进一步改善曝光系统光强指明了方向。The exposure system is the key parts of contact aligner and proximity aligner. Exposure intensity has very important influence on photolithography process. In the article exposure system is analyzed detailedly, various factors influencing exposure intensity are discussed and calculated, and also how to improve the intensity of exposure system are pointed out.

关 键 词：光刻机 曝光系统 曝光强度 

分 类 号：TN305.7[电子电信—物理电子学]