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作 者:齐彪[1] 刘杨[1] 饶裕 魏凯[1] 强盛[1] QI Biao LIU Yang RAO Yu WEI Kai QIANG Sheng(School of Astronautics, Harbin Institute of Technology, Harbin 150001 China)
机构地区:[1]哈尔滨工业大学航天学院,黑龙江哈尔滨150001
出 处:《自动化技术与应用》2017年第10期131-134,共4页Techniques of Automation and Applications
基 金:国家极大规模集成电路制造装备与成套工艺的国家重大科技专项(编号2009ZX02207)
摘 要:双工件台换台是光刻机研制的核心,换台过程要求高速度和高精度,因此扰动的存在极易导致换台的失败。本文主要对Y向多电机同步过程中的扰动进行了分析与抑制。结合现有的同步控制策略,介绍了基于扰动补偿的同步控制策略,将扰动观测器应用在补偿回路,并进行了仿真验证研究,然后针对Y向的负载扰动,设计了负载扰动动态补偿器,对上述同步控制策略进行了修正,并通过仿真验证了其有效性。Dual wafer stages exchanging is the core of developing lithography, the process of stages exchanging requires high speed and precision, so the existence of the disturbance Can easily lead to the failure of stages exchanging. In this paper, the disturbance in multi-motor synchronous movement in the Y direction is analyzed and suppressed. Combined with the existing synchronous control strategy, it describes the synchronous control strategy based on disturbance compensation which sets the disturbance observer application at compensation loop, and it also makes some simulation research. Then as for the load disturbance, the paper designs dynamic load disturbance compensation and modifies the synchronization control strategy, its effectiveness is verified by simulation.
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