用于扫描干涉场曝光的超精密微动台设计与控制  

Design and Control of Ultra-Precision Fine Positioning Stage for Scanning Beam Interference Lithography

作　　者：鲁森[1,2] 杨开明[1,2] 朱煜[1,2] 王磊杰[1,2] 张鸣[1,2] 杨进 Lu Sen;Yang Kaiming;Zhu Yu;Wang Leijie;Zhang Ming;Yang Jin(State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China;Beijing Key Laboratory of Precision~Ultra-Precision Manufacturing Equipments and Control Tsinghua University, Beijing 100084, China;Basic Technology Research Department, Dongfeng Commercial Vehicle Technical Center, Wuhan, Hubei 430056, China)

机构地区：[1]清华大学机械工程系摩擦学国家重点实验室,北京100084 [2]清华大学精密超精密制造装备及控制北京市重点实验室,北京100084 [3]东风商用车技术中心基础技术研究室,湖北武汉430056

出　　处：《光学学报》2017年第10期202-210,共9页Acta Optica Sinica

基　　金：国家科技重大专项"磁悬浮工件台关键技术研究"(2012ZX02702-006)

摘　　要：扫描干涉场曝光(SBIL)系统中曝光效果与工件台的运动性能密切相关。为了制作纳米精度的大面积平面光栅,工件台采用了粗微叠层结构设计,其中微动台是实现工件台运动精度的关键。基于SBIL原理,推导了干涉条纹周期测量精度与曝光对比度的关系。针对移动分光镜测量干涉条纹周期的方法,结合周期测量精度需求,分析了微动台定位精度指标,提出了实现微动台x、y、θz三个自由度定位精度的控制器设计方法,并在微动台系统上进行了实验验证。结果表明,微动台x方向定位精度可达±1.51nm,y方向定位精度可达±5.46nm,θz定位精度可达±0.02μrad,可以满足SBIL的需求和干涉条纹周期测量的精度要求。Exposure result of scanning beam interference lithography（SBIL）system is closely related to the movement property of the stage.The stage adopts coarse-fine dual stage mechanism to fabricate large-area plane grating with nanometer accuracy.The fine stage is the key point of the movement accuracy of the stage.According to the principle of SBIL,the relationship between interference fringe period measurement accuracy and exposure contrast is deduced.For the period measurement method of interference fringe by moving beam-splitter,the positioning accuracy index of the fine positioning stage is analyzed by considering period measurement accuracy requirements.A controller design method is proposed to realize the positioning accuracies of the degrees of freedom in x,y,θz directions.And the experiment is conducted in the fine positioning stage system.The results show that the positioning accuracy of x,y,θzcan achieved ±1.51 nm,±5.46 nm and ±0.02μrad,respectively,which can satisfy the SBIL exposure requirements and the interference fringe period measurement accuracy requirements.

关 键 词：测量 扫描干涉场曝光 微动台 条纹周期测量精度 相位锁定 

分 类 号：O436.1[机械工程—光学工程]