一种优化微镜像素灰度提高数字光刻成像质量的方法  

Optimizing Pixel Gray to Improve the Imaging Quality of Digital Lithography

作　　者：时招军[1,2] 李其申[1] 张胜[1] 

机构地区：[1]江西省图像处理与模式识别重点实验室(南昌航空大学),南昌330063 [2]南昌航空大学信息工程学院,南昌330063

出　　处：《南昌航空大学学报（自然科学版）》2017年第3期23-27,共5页Journal of Nanchang Hangkong University(Natural Sciences)

基　　金：国家自然科学基金(61661037;61464008);江西省图像处理与模式识别重点实验室项目(ET201604247);南昌航空大学博士启动基金(EA201504529)

摘　　要：针对DMD数字光刻成像畸变问题,提出一种优化DMD微镜像素灰度值提高光刻成像质量的方法。将微镜像素的灰度值编码为0,1二进制位串,然后利用梯度下降法优化微镜像素的灰度。对矩形掩模图和T型掩模图进行仿真验证表明,两种图形的误差值(PE)分别下降了83.9%、80.5%,该方法可以较大程度地提高数字光刻成像质量。Aiming at the problem of imaging distortion in DMD digital lithography system,a method to improve the imaging quality based on optimizing the DMD pixel gray is proposed. In the method,the mirror pixel gray are coded as binary mask with further sampled,and the mirror pixel gray are optimized with the gradient descent method. The lithography image of rectangular and T patterns are simulated,the pattern errors are reduced by 66. 1% and 27. 3%,respectively. The results show that this method can effectively improve the imaging quality.

关 键 词：数字光刻 成像畸变 梯度下降法 像素灰度 二元掩模 

分 类 号：TN305.7[电子电信—物理电子学]