检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:汪海波 杨金[1] 鲁世斌[1] 张忠祥[1] 蒋先伟[1] 王菲菲[1] 樊敏[1] 彭勇 WANG Haibo;YANG Jin;LU Shibin;ZHANG Zhongxiang;JIANG Xianwei;WANG Feifei;FAN Min;PENG Yong(Anhui Province Key Laboratory of Simulation and Design for Electronic Information System,Hefei NormalUniversity,Hefei Anhui 230601,China;Nationt Semiconductor(Chizhou)Co.,Ltd.,Chizhou Anhui 230000,China)
机构地区:[1]合肥师范学院电子信息系统仿真设计安徽省重点实验室,安徽合肥230601 [2]池州华钛半导体有限公司,安徽池州230000
出 处:《润滑与密封》2018年第6期43-48,54,共7页Lubrication Engineering
基 金:安徽高校省级自然科学研究项目(KJ2016A574;KJ2015A276;KJ2014A208);合肥师范学院人才科研启动基金项目(2016rcjj07);安徽省科技重大专项(批准号:17030901009)
摘 要:磨料的粒径分布严重影响蓝宝石抛光,传统的抛光模型无法说明粒径分布的作用效果。针对这一问题,以不同粒径磨料混合放大粒径分散性影响,研究单一磨料和2种粒径混合磨料对抛光速率的影响。结果表明:2种不同粒径混合能够明显提高抛光速率,在一定质量比条件下可以达到最大值,并且粒径差距越大,抛光速率越快;不同粒径磨料混合影响抛光温度和磨料使用寿命,这是因为其一方面增加磨料整体羟基官能团数量,另一方面可以形成不同磨料间的密堆积,增加与蓝宝石接触面积。以此为基础,讨论多粒径分布的抛光动力学过程,并提出抛光动力学模型。Particle distribution of abrasive has a great influence on chemical mechanical polishing( CMP) of sapphire,while traditional polishing model can not illustrate the effect of particle distribution.Focused on the problem,the abrasives of two different particle diameter were mixed to enlarge the distribution effect of particle diameter on polishing sapphire,the influence of single abrasive and mixed abrasives of two different particle diameter on the polishing rate was studied.Results show two-diameter abrasive hybrid can efficiently increase removal rate of sapphire,and the removal rate can reach the maximum value at a certain mass ratio of two-diameter abrasive.The bigger the particle diameter difference between two abrasives,the higher the removal rate of sapphire.The particle hybrid influences the polishing temperature and the service life of abrasive,that is because the particle hybrid can increase the number of hydroxyl group,the contact area for density stacking between abrasive and sapphire.A dynamic process of polishing using hybrid abrasive was discussed,and the polishing dynamic model was presented.
关 键 词:分散性 蓝宝石 化学机械抛光 粒径分布 抛光速率
分 类 号:TH117.1[机械工程—机械设计及理论]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.33