新型5×5分束达曼光栅的设计与制作  

Design and Fabrication of a Novel 5×5 Beam Dammann Grating

作　　者：周丽[1] 钟青[2] 李劲劲[2] 邢海斌 王雪深[2] 周哲海[1] 王晓玲[1] Zhou Li;Zhong Qing;Li Jinjin;Xing Haibin;Wang Xueshen;Zhou Zhehai;Wang Xiaoling(Beijing Key Laboratory for Optoelectronic Measurement Technology,Beijing Information Science and Technology University,Beijing 100192,China;National Institute of Metrology,Beijing 100029,China)

机构地区：[1]北京信息科技大学光电测试技术北京市重点实验室,北京100192 [2]中国计量科学研究院,北京100029

出　　处：《微纳电子技术》2018年第9期677-682,共6页Micronanoelectronic Technology

基　　金：国家自然科学基金资助项目(61475021);中国计量科学研究院探索性创新项目(31AKYCX170217);北京信息科技大学勤信学者支持计划资助项目(QXTCP-A201701);北京信息科技大学2017—2018年度“实培计划”资助项目

摘　　要：基于理论设计了一种面内旋转对称的新型5×5分束达曼光栅,研究并优化了光栅制作中曝光、显影及深刻蚀等关键工艺参数。采用接触式曝光和感应耦合等离子体（ICP）刻蚀技术,在石英基底上制作出达曼光栅结构。实验中通过优化石英基底上接触式曝光时间和显影时间,较好控制了曝光图形失真;进一步通过控制ICP刻蚀工艺参数,获得了刻蚀深度为（750±10）nm的石英衬底,实现了达曼光栅器件的制备。通过衍射光学特性评测得到了理论设计的零级衍射场均匀分布的5×5点阵,总的衍射效率达到53%,不均匀性仅为0.19%。实验证明了理论设计与工艺技术的可靠性,为达曼光栅器件的集成光学系统应用奠定基础。A novel 5×5 beam Dammann grating with in-plane rotational symmetry was designed in theoretically.Taking account in the requirement,the key process parameters for fabricating the Dammann grating were studied and optimized,involving the exposure,developing and deep etching.By using the contact exposure and inductively coupled plasma（ICP）etching technique,a Dammann grating structure was fabricated on the quartz substrate.In the experiment,the distortion of the exposure pattern was effectively controlled by optimizing the contact exposure time and developing time on the quartz substrate.Furthermore,the quartz substrate with the etching depth of（750±10）nm was obtained by controlling the ICP etching parameters,and the Dammann grating device was prepared.Through evaluating the diffraction optical properties,the theoretically designed 5×5 spots array with evenly distributed zero-order diffraction field was obtained.The total diffraction efficiency reaches 53%,and the heterogeneity is only 0.19%.The experimental results demonstrate that the theoretical design and technology are reliable,laying a foundation for the integrated optical system application of the Dammann grating device.

关 键 词：达曼光栅 二元光学 光刻 邻近效应 深刻蚀 

分 类 号：TN305.7[电子电信—物理电子学]