EACVD中用氢原子谱线测定电子平均能量  

The Mean Energy of Electron Determined by Atomic Hydrogen Emission Line in EACVD

作　　者：董丽芳[1] 张玉红[1] 

机构地区：[1]河北大学物理科学与技术学院,河北保定071002

出　　处：《光谱学与光谱分析》2002年第5期732-733,共2页Spectroscopy and Spectral Analysis

基　　金：河北省自然科学基金项目 (50 2 1 2 1 )

摘　　要：采用蒙特卡罗方法 ,对EACVD中氢原子的发射过程进行了模拟。给出了由氢原子谱线测定电子平均能量的方法 ,结果对EACVD生长金刚石薄膜过程中实时监测电子平均能量 ,进而可以有效地控制工艺条件 。The process of atomic hydrogen emission in EACVD is simulated by Monte Carlo method. A method of determining the mean energy of electron is given by the ratio of atomic hydrogen emission line. The result is of great importance to determining the mean energy of electron in situ in the process of diamond film deposited by EACVD. Then, high quality diamond films can be obtained by controlling the conditions of technology efficiently.

关 键 词：EACVD 测定 电子平均能量 化学气相沉积 氢原子发射谱线 金刚石薄膜 生长过程 蒙特卡罗模拟 

分 类 号：TN304.18[电子电信—物理电子学] TN304.055