TiO_2薄膜的结构和光学性质的研究  

Structural and Optical Properties of TiO_2 Thin Films

作　　者：谢强[1] 王取泉[1] 魏正和[1] 周正国[1] 

机构地区：[1]武汉大学物理科学与技术学院,湖北武汉430072

出　　处：《武汉大学学报（理学版）》2002年第5期593-596,共4页Journal of Wuhan University:Natural Science Edition

基　　金：国家自然科学基金资助项目 (5 98710 3 3 )

摘　　要：以金属钛为靶材 ,用反应射频溅射法制备了TiO2 薄膜 ,并在 6 0 0～ 90 0℃下进行了热处理 .经XRD测量 ,在 6 0 0～ 80 0℃下TiO2 薄膜为锐钛矿和金红石两种结构的混合态 ,在 90 0℃下TiO2 薄膜为纯金红石结构 .研究TiO2薄膜的SEM照片和UV vis透射光谱发现 ,不同的热处理温度会影响TiO2 薄膜中锐钛矿和金红石两种结构的比例 ,从而导致TiO2 薄膜的微观形貌、折射率、禁带宽度等性质的变化 .TiO 2 thin films were prepared by reactive RF sputtering and annealed at 600 to 900℃. The films consist of rutile and anatase structure annealed at 600 to 800℃ and pure rutile structure annealed at 900℃ by X\|ray diffraction (XRD) analysis. According to our research on XRD, the ratio of two structure of TiO 2 films is mainly influenced by anneal temperature and the rutile structure become the main structure as the anneal temperature increasing. And the SEM pictures show that the size of TiO 2 grains in films ranges from 200 nm to 600 nm and increases as the anneal temperature increasing. Refraction index ( n ) and indirect optical absorption band\|gaps ( E g ) of TiO 2 films were caculated according to UV\|vis transmission spectrum. The result shows that the refraction index ( n ) increases from 2.38 to 2.51 and the indirect optical absorption band\|gaps ( E g ) decreases from 3.2 to 3.1 eV as the anneal temperature increasing from 600 to 800℃.

关 键 词：TIO2薄膜 结构特性 光学性质 二氧化钛薄膜 反应射频溅射法 微观形貌 折射率 

分 类 号：O484.41[理学—固体物理]