膜厚对直流反应磁控溅射沉积NiO薄膜的结构与电致变色性能的影响  

Effects of Film Thickness on Structural and Electrochromic Properties of NiO Films Deposited by DC Reactive Magnetron Sputtering

作　　者：张泽华 赵青南[1,2] 刘翔 李渊[1] 曾臻 董玉红 赵杰 ZHANG Ze-hua;ZHAO Qing-nan;LIU Xiang;LI Yuan;ZENG Zhen;DONG Yu-hong;ZHAO Jie(State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology,Wuhan 430070,China;Jiangsu Xiuqiang Glasswork Co.,Ltd.,Suqian 223800,China)

机构地区：[1]武汉理工大学硅酸盐建筑材料国家重点实验室,武汉430070 [2]江苏秀强玻璃工艺股份有限公司,宿迁223800

出　　处：《硅酸盐通报》2018年第9期2759-2765,共7页Bulletin of the Chinese Ceramic Society

基　　金：国家十三五重点研发计划子课题(2016YFB0303903-04)

摘　　要：采用直流反应磁控溅射法在FTO玻璃基片上沉积了不同厚度的氧化镍(NiO)薄膜。用X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM)、X射线光电子能谱仪(XPS)、台阶仪、紫外可见分光光度计、电化学工作站,研究了NiO薄膜厚度对其微观结构、形貌,以及电致变色性能的影响。结果表明,随着溅射时间增加,NiO薄膜厚度增加,试样的初始态可见光谱透过率逐渐降低,(200)晶面的XRD衍射峰强度逐渐增加;以1 M KOH溶液作为电解质,随着NiO薄膜厚度增加,薄膜电荷储存量逐渐增大。NiO薄膜厚度为920 nm的试样着色效率最高,达到了23.46 cm2/C;80 nm厚度的薄膜试样光学调制幅度最大,波长550 nm处为40.85%。薄膜越厚,着、褪色时间越长;所有试样着色时间均大于褪色时间,80 nm厚度的薄膜试样的着色、褪色时间最快,分别为4.47 s和2.28 s。Nickel Oxide(NiO)thin films of various thicknesses were grown on glass substrates by dc reactive magnetron sputtering technique.Structural and electrochromic properties of NiO films as a function with various thickness were investigated by using X-ray diffraction,scanning electron microscope,X-ray photoelectron spectroscopy,step profiler,spectrophotometer and electrochemical workstation.XRD analysis revealed that(200)is the preferred orientation,and the peak intensity increases with thickness suggesting an improvement of the crystallinity.The transmittance of as-deposited films decreased as the thickness of films increased.Using 1 M KOH for electrolyte,the charge capacity increases with thickness.The coloration efficiency increases with thickness,reaching 23.46 cm 2/C for the sample with 920 nm after 30 cycles.Transmittance modulation of NiO films reaches 40.85%at 550 nm for the sample with 80 nm.We used chronoamperometry to calculate coloration/bleaching time of NiO films,and coloration time was long than bleaching time for all the samples.Coloration and bleaching time increases with thickness,and they are 4.47 s and 2.28 s for the sample with 80 nm,respectively.

关 键 词：膜厚 NiO薄膜 电致变色 直流反应磁控溅射 

分 类 号：TG146[一般工业技术—材料科学与工程]