钴与钛的去除速率选择比控制及电偶腐蚀  

Control of the Removal Rate Selection Ratio and Galvanic Corrosion Between Cobalt and Titanium

作　　者：梁婷伟 王胜利 王辰伟 刘凤霞 Liang Tingwei;Wang Shengli;Wang Chenwei;Liu Fengxia(School of Electronic and Information Engineering,Hebei University of Technology,Tianjin 300130,China;Tianjin Key Laboratory of Electronic Materials and Devices,Tianjin 300130,China)

机构地区：[1]河北工业大学电子信息工程学院,天津300130 [2]天津市电子材料与器件重点实验室,天津300130

出　　处：《半导体技术》2019年第11期876-882,共7页Semiconductor Technology

基　　金：国家科技重大专项资助项目(2016ZX02301003-004-007);河北省自然科学基金资助项目(E2019202367);河北省自然科学基金青年基金资助项目(F2015202267);河北工业大学优秀青年科技创新基金资助项目(2015007)

摘　　要：研究了抛光液pH值、酒石酸钾(PTH)、双氧水(H2O2)和硅溶胶对钴插塞和钛阻挡层的去除速率及选择比的影响,并讨论了前3种因素与钴和钛电偶腐蚀的变化关系。采用正交抛光实验探讨了各因素对钴和钛抛光速率的主导度,利用塔菲尔曲线研究了各因素对钴和钛腐蚀电位差的影响趋势。结果显示,升高pH值(由8到10)可大幅降低钴的去除速率至27.7 nm/min,而对于钛的去除速率无明显影响;PTH的引入可同时提高钴与钛的去除速率,并降低二者腐蚀电位差;H2O2的增加可有效降低钴的去除速率而同时增大钛的去除速率。因此,升高pH值有利于实现钴和钛的去除速率一致性;固定pH值而改变PTH和H2O2体积分数可实现钴与钛的去除速率及选择比可控。The effects of pH values of the polishing solution, potassium tartrate hemihydrate(PTH), hydrogen peroxide(H2O2) and silica sol on the removal rate and selection ratio of cobalt plug and titanium barrier layer were studied. The variation relationship among the first three factors and galvanic corrosion of cobalt and titanium was discussed. The dominant degree of each factor to the polishing rates of cobalt and titanium was studied by orthogonal polishing experiment. The Tafel curve was utilized to study the influence tendency of various factors on the corrosion potential difference between cobalt and titanium. The results show that increasing the pH value(from 8 to 10) can significantly reduce the removal rate of cobalt to 27.7 nm/min, but has no obvious effect on the removal rate of titanium. The introduction of PTH can simultaneously increase the removal rates of cobalt and titanium and reduce the corrosion potential difference between them. The increase of H2O2 can effectively reduce the removal rate of cobalt while increasing the removal rate of titanium. Therefore, increasing the pH value is conducive to achieving the consistency of the removal rates of cobalt and titanium, and changing the volume fractions of PTH and H2O2 with fixed pH value can achieve the controllable removal rates and selection ratio of cobalt and titanium.

关 键 词：钴 钛 去除速率 选择比 主导度 腐蚀电位差 

分 类 号：TN305.2[电子电信—物理电子学]