微纳通道型真空漏孔研究进展  

Review on the Research Progress of Vacuum Leak with Micro-nano Channels

作　　者：林文豫 王旭迪[1] LIN Wenyu;WANG Xudi(Hefei University of Technology,Hefei 230009,China)

机构地区：[1]合肥工业大学

出　　处：《真空与低温》2020年第1期48-54,共7页Vacuum and Cryogenics

基　　金：国家自然科学基金面上项目(61574053、61871172)

摘　　要：传统真空漏孔存在难以实现尺寸可控制作、分子流压力范围有限等问题,而利用微纳通道型真空漏孔可以有效解决上述问题。本文阐述了一维/二维微纳通道型真空漏孔的加工方法,即使用光学曝光、刻蚀工艺在硅基底上制备微纳沟槽,结合键合技术实现微纳通道密封;通过金属封装、玻璃浆料键合、毛细管连接工艺实现硅基微纳通道型真空漏孔与金属真空法兰的封装连接。该类型漏孔有望在真空计量、极小流量控制和漏率测试等方面取得应用。Traditional vacuum leaks are featured with problems that are difficult to make feature dimension controllable and limited range of molecular flow.Using the micro-nano channels as gas transmission paths can solve the above problems effectively.It introduces a method to manufacture one-dimensional/two-dimensional micro-nano channels by using optical exposure and etching process to make the channels on silicon substrates,combined with bonding technique to seal.Through metal encapsulation,glass frit bonding and capillary connection packaging,the sealing connection between silicon-based micro-nano channel vacuum leak and metal vacuum flange is realized.Such leaks are expected to be applied in vacuum metering,very small flow control and leak rate testing.

关 键 词：真空漏孔 微纳通道 真空封装 分子流 

分 类 号：TB774[一般工业技术—真空技术]