高纯六氟化钨的制备技术研究进展  

Progress in Synthesis of High Purity Tungsten Hexafluoride

作　　者：缪光武 白占旗[1] 张金柯[1] 何双材 曾群 胡欣[1] 刘武灿[1] MIAO Guangwu;BAI Zhanqi;ZHANG Jinke;HE Shuangcai;ZENG Qun;HU Xin;LIU Wucan(Zhejiang Research Institute of Chemical Industry,Hangzhou 310023,China)

机构地区：[1]浙江省化工研究院有限公司

出　　处：《低温与特气》2020年第1期1-5,共5页Low Temperature and Specialty Gases

摘　　要：随着电子工业迅速发展,六氟化钨被广泛应用于半导体行业,其需求量日益扩大,对其纯度要求也越来越苛刻。综述了现有六氟化钨最常用的制备及纯化方法,分析了这四种纯化方法各自优缺点。在实际生产中,应根据六氟化钨中所含杂质的种类,联用多种纯化方法来获得高纯六氟化钨产品。此外,应尽早实现高纯六氟化钨工业化生产,填补国内相关领域空白。With the rapid development of the electronic industry,tungsten hexafluoride is widely used in the semiconductor industry.The demands of it are increasing,and its purity is subjected to severe demands.The most commonly method for preparing and purifying tungsten hexafluoride were introduced in this paper,and analyze the advantages and disadvantages of respective four purification methods.In actual production,depending on the kind of impurities contained in the tungsten hexafluoride,a high-purity tungsten hexafluoride product should be obtained by simultaneously using various purification methods.In addition,the industrial production of high-purity tungsten hexafluoride should be realized as soon as possible to fill gaps in related fields in China.

关 键 词：六氟化钨 制备 纯化 电子气体 

分 类 号：TQ117[化学工程—无机化工]