等离子抛光石英玻璃表面粗糙度研究  

Research on Surface Roughness of Plasma Polished Quartz Glass

作　　者：郑才国 陈庆川[1] 聂军伟[1] 李民久 陈美艳 ZHENG Caiguo;CHEN Qingchuan;NIE Junwei;LI Minjiu;CHEN Meiyan(Southwestern Institute of Physics,Chengdu 610041,China;Engineering and Technical College,Chengdu University of Technology,Leshan 614007,Sichuan,China)

机构地区：[1]核工业西南物理研究院,成都610041 [2]成都理工大学工程技术学院,四川乐山614007

出　　处：《实验室研究与探索》2020年第2期9-11,59,共4页Research and Exploration In Laboratory

基　　金：国家自然科学基金项目(11475059);乐山市重点科技计划项目(19GZD039);成都理工大学工程技术学院院级基金项目(C122017029)。

摘　　要：为了实现光学元件表面超光滑加工,避免传统机械加工方法造成的亚表面损伤,将射频等离子体加工应用于石英玻璃抛光加工。分析了通过调节离子束的能量、束流密度和入射角等工艺参数对抛光效果的影响。试验结果表明,随离子束能量的增加,试件的表面粗糙度RMS先减小后增大,当离子束能量为200~600 eV时试件表面粗糙度明显提高,为离子束抛光能量最佳范围。离子束流入射最佳角度范围为45°~60°,随着离子束抛光时间的增加,试样表面粗糙度先降低后增大。In order to achieve ultra-smooth surface processing of optical components and avoid sub-surface damage caused by conventional processing methods,RF plasma processing is applied to the processing of ultra-smooth optical components and RF plasma polishing of quartz glass. The important parameters,such as ion beam source power,the density of ion beam and the influence of incident angle on the etching rate and roughness of glass are researched.Experimental results show that the surface roughness RMS decreases first and then increases with the increase of ion beam energy. The ion beam energy 200-600 eV range dramatically improves surface roughness,as the best ion beam polishing energy range. The optimal angle of incidence of the ion beam is in the range of 45°-60°. With the increase of ion beam polishing time,the surface roughness of the sample decreases first and then increases.

关 键 词：离子束抛光 超光滑 射频离子源 表面粗糙度 

分 类 号：TP391[自动化与计算机技术—计算机应用技术]