248 nm深紫外光刻胶用成膜树脂的研究进展  

Development of Matrix Resins for 248 nm Deep UV Photoresist

作　　者：魏孜博 马文超 邱迎昕 WEI Zibo;MA Wenchao;QIU Yingxin(Yanshan Branch,Sinopec BRICI,Beijing 102500,P.R.China;Rubber and Plastic Synthesis National Engineering Research Center,Beijing 102500,P.R.China)

机构地区：[1]中国石油化工股份有限公司北京化工研究院燕山分院,北京102500 [2]橡塑新型材料合成国家工程研究中心,北京102500

出　　处：《影像科学与光化学》2020年第3期430-435,共6页Imaging Science and Photochemistry

基　　金：中石化总部项目(G3365-2019-Z1912)。

摘　　要：综述了用于248 nm化学增幅型深紫外光刻胶的不同种类和结构的成膜树脂,以及所使用单体的研发进展,包括聚甲基丙烯酸甲酯及其衍生物、聚对羟基苯乙烯及其衍生物、N取代的马来酰亚胺衍生物,以及其他聚合物等,对不同结构成膜树脂的曝光条件、对光刻胶性能的影响进行了介绍。Different kinds of matrix resins and structures used in 248 nm chemically amplified deep UV photoresist were summarized,including poly(methyl methacrylate)and its derivatives,poly(p-hydroxystyrene)and its derivatives,N-substituted maleimide derivatives and other polymers,and the influences of the structure and exposure conditions of film-forming resins or monomers on photoresist properties were discussed.

关 键 词：光刻胶 成膜树脂 化学增幅型 曝光 

分 类 号：TQ577[化学工程—精细化工] TQ320.7