PDMS多层次蘑菇形微结构的制作  

Fabrication of the PDMS Multi-Layer Mushroom-Shaped Microstructures

作　　者：单晗 刘军山[1] Shan Han;Liu Junshan(Key Laboratory for Micro/Nano Technology and System of Liaoning Province,Dalian University of Technology,Dalian116024,China)

机构地区：[1]大连理工大学辽宁省微纳米技术及系统重点实验室,大连116024

出　　处：《微纳电子技术》2020年第5期395-398,408,共5页Micronanoelectronic Technology

基　　金：国家自然科学基金资助项目(51875083,51621064)。

摘　　要：提出了一种基于光刻胶牺牲层技术的用于制作多层次SU-8模具的新方法,并进一步采用浇注成型的方法制作了聚二甲基硅氧烷(PDMS)多层次蘑菇形微结构。在多层次SU-8模具的制作过程中,使用了正性光刻胶BP212作为牺牲层,并采用超声辅助显影的方法使显影的时间大大缩短。通过对多层次SU-8模具预处理,有效减小了多层次SU-8模具与PDMS的结合力,从而提高了PDMS脱模的成功率。对制作的PDMS多层次蘑菇形微结构和PDMS单层次微柱结构进行了接触角测试。结果表明,PDMS多层次蘑菇形微结构的接触角为150.93°±1.6°,PDMS单层次微柱结构的接触角为139.19°±0.1°。由此可知PDMS多层次蘑菇形微结构具有优异的超疏水性能。A novel method based on the photoresist sacrificial layer technology was presented to fabricate the multi-layer SU-8 mold,and the polydimethylsiloxane(PDMS)multi-layer mushroom-shaped microstructure was further fabricated by the cast molding method.In the process of fabricating the multi-layer SU-8 mold,apositive photoresist BP212 was used as the sacrificial layer and the time of developing was greatly shortened by the ultrasonic-assisted development method.By pretreating the multi-layer SU-8 mold,the adhesion between the multi-layer SU-8 mold and PDMS was effectively reduced,thus increasing the success rate of PDMS demolding.The contact angles of the fabricated PDMS multi-layer mushroom-shaped microstructures and the PDMS single-layer micropillars were tested.The results show that the contact angles of the PDMS multi-layer mushroom-shaped microstructure are 150.93°±1.6°,and the contact angles of the PDMS single-layer micropillar are 139.19°±0.1°.Thus it can be seen that the PDMS multilayer mushroom-shaped microstructure has an excellent super-hydrophobic performance.

关 键 词：聚二甲基硅氧烷(PDMS) 多层次 蘑菇形微结构 牺牲层 SU-8 超疏水 

分 类 号：TH703[机械工程—仪器科学与技术]