PMMA-Based Microsphere Mask for Sub-wavelength Photolithography  

作　　者：Wenhe Feng Yin Chi Wan Xincai Wang 

机构地区：[1]Singapore Institute of Manufacturing Technology(SIMTech),2 Fusionopolis Way,Innovis#08-04,Singapore 138634,Singapore

出　　处：《Nanomanufacturing and Metrology》2020年第3期199-204,共6页纳米制造与计量（英文）

基　　金：a core-funded project(No.C16-M-034)of SIMTech,A*STAR Research Entities.

摘　　要：The authors present a polymethyl methacrylate(PMMA)-based,reusable microsphere mask used in the laser sub-wavelength photolithography.In order to overcome the diffraction limit to achieve nano-structuring using l-|im laser wavelength,the photolithography technique was conventionally characterized by applying a one-off monolayer of silica microspheres serving as Mie scatterers.Addressing the major limitation of this technique,which was that the monolayer of microspheres must be prepared on the sample surface prior to fabrication,the proposed hot press approach could firmly fuse the 1silica microspheres to the PMMA base without the use of adhesives.The PMMA-based microsphere mask could hence reduce the amount of work for the monolayer preparation and was proven reusable for at least 20 times without damage to top or bottom surfaces.Using the mask,dimples that were 0.7 pm in diameter and 40 nm in depth were produced on tool steel by a single pulse of picosecond laser irradiation.

关 键 词：Ultrafast laser Microspheres Mie-scattering PHOTOLITHOGRAPHY MASK Micro/nano-fabrication process 

分 类 号：TN2[电子电信—物理电子学]