碳化硅质高温陶瓷膜的低温烧成  

Low Temperature Firing of SiC-Based High Temperature Ceramic Membrane

作　　者：张久美[1] 程之强 薛友祥[1] 赵世凯[1] 唐钰栋 宋涛[1] 李小勇[1] 李杰[1] ZHANG Jiu-Mei;CHENG Zhi-Qiang;XUE You-Xiang;ZHAO Shi-Kai;TANG Yu-Dong;SONG Tao;LI Xiao-Yong;LI Jie(Shandong Industrial Ceramic Research&Design Institute Co.,Ltd,Zibo 255000,China)

机构地区：[1]山东工业陶瓷研究设计院有限公司,山东淄博255000

出　　处：《现代技术陶瓷》2020年第5期312-316,共5页Advanced Ceramics

基　　金：2016年度泰山产业领军人才。

摘　　要：本文以碳化硅骨料、章村土系结合剂和核桃壳粉为原料,通过等静压成型工艺和低温烧结制备了碳化硅质高温陶瓷膜材料。研究了成型压力对坯体强度以及成型压力和烧成温度对膜材料强度、孔径、气孔率和透气阻力的影响。结果发现,当成型压力为70 MPa、烧成温度为1250~1270°C时,制品综合性能较优。In this paper,silicon carbide high temperature ceramic membrane materials were prepared by isostatic pressing and low temperature firing using silicon carbide aggregates,chapter binders of Zhangcun clay and walnut shell powders as raw materials.The effects of molding pressure on the strength of the green body and the effects of molding pressure and firing temperature on the strength,pore size,porosity and gas permeability of the sintered membrane materials were investigated.It was found through the performance comparison that,when the molding pressure is 70 MPa and the firing temperature is in the range of 1250°C^1270°C,the product exhibits the best comprehensive performance.

关 键 词：低温烧成 碳化硅 高温陶瓷膜 

分 类 号：TQ174[化学工程—陶瓷工业]