集束型多层纳米薄膜沉积设备的研制  

Novel Cluster Tool for Multilayer Nanofilm Deposition: An Instrumentation Study

作　　者：杨胜 夏洋[1,2,3] 兰丽丽 陶晓俊 冯嘉恒 明帅强 卢维尔 屈芙蓉[1] 刘涛 Yang Sheng;Xia Yang;Lan Lili;Tao Xiaojun;Feng Jiaheng;Ming Shuaiqiang;Lu Weier;Qu Furong;Liu Tao(Microelectronic Instrument and Equipment Center,Institute of Microelectronics of Chinese Academy of Sciences,Beijing 100029,China;University of Chinese Academy of Sciences,Beijing 100049,China;Jiaxing Kemin Electronic Equipment Technology Co.,LTD,Jiaxing 314006,China)

机构地区：[1]中国科学院微电子研究所仪器设备研发中心,北京100029 [2]中国科学院大学,北京100049 [3]嘉兴科民电子设备技术有限公司,嘉兴314006

出　　处：《真空科学与技术学报》2020年第11期1096-1102,共7页Chinese Journal of Vacuum Science and Technology

摘　　要：运用模块化的设计构想,将等离子体增强原子层沉积工艺单元、热型原子层沉积工艺单元,直流磁控溅射单元和射频磁控溅射工艺单元进行高度优化集成,研制了集束型多层纳米薄膜沉积设备。设备创新采用真空旋转传输平台,替代了传统集成设备的机械手结构,实现了样品在高真空(5×10^-5 Pa)中传输,而且传输速度快(2~3 s),有效地减少污染,保证样品表面物性的稳定。设备可在全真空的环境下,实现多层纳米薄膜的制备,同时可以对薄膜生长实现原子层精度的控制。设备的磁控溅射工艺平台可以安装金属掩膜板,直接制备图形薄膜。另外设备具有非常灵活的扩展性,针对薄膜工艺需求的不同,可以集成其他的薄膜制备工艺单元。A novel type of cluster tool has been successfully developed for growth of multilayered nanofilm and nanostructured patterns.The cluster tool can be conveniently used for high precision synthesis of multilayered nanofilm in quite a few techniques in a specific vacuum chamber,including,but not limited to the plasma enhanced atomic layer deposition(PEALD),thermal atomic layer deposition(TALD),DC and RF magnetron sputtering.The lab-designed rotary transfer platform allows for rapid transfer of a substrate and/or a pre-coated nanofilm sample,in 2~3 s at a base pressure of 5×10^-5 Pa,between chambers from one subunit to any other subunit to deposit different layers in different growth modes without exposure to air which prevents oxidation,contamination and deterioration of film properties.Test results show that the newly-developed cluster tool meets the stringent design requirements.

关 键 词：原子层沉积 磁控溅射 薄膜制备 集束型设备 

分 类 号：TN305.8[电子电信—物理电子学]