离子束溅射沉积速率变化规律研究  

Changing Rules of Deposition Rate with Time in Ion Beam Sputtering System

作　　者：李定 李钱陶[1] 熊长新[1] LI Ding;LI Qian-tao;XIONG Chang-xin(Huazhong Institute of Electro-Optics-Wuhan National Laboratory for Optoelectronics,Wuhan 430223,China)

机构地区：[1]华中光电技术研究所-武汉光电国家研究中心,湖北武汉430223

出　　处：《光学与光电技术》2020年第6期86-90,共5页Optics & Optoelectronic Technology

摘　　要：离子束溅射(IBS)系统具有稳定的沉积速率和良好的工艺重复性,然而在沉积初期其速率仍会发生变化。为研究其变化规律,采用离子束溅射技术,以Nb2O5和Al2O3为高低折射率材料,制备了中红外波段高反膜,用傅里叶变换红外光谱仪测试了膜层的反射率光谱曲线,采用扫描电镜测试了膜层的断面形貌,结果显示膜层厚度随着层数的增加而减小。通过光谱反演的方法,建立沉积速率随时间呈指数变化的模型,通过优化设计,使理论曲线与实测结果的吻合程度大大提高,均方根误差由10%下降至1.5%。研究结果为时间监控方式下的膜厚修正提供了参考依据。For an ion beam sputtering(IBS)system,the depositon rate is very stable and the reproducibility is excellent,but at the beginning of a deposition the rate may still change.In order to study the change rule,mid-infrared reflectors are prepared by using Nb2O5 and Al2O3 as high and low refractive index materials.Fourier-transform infrared spectroscopy is used to measure the reflection spectra,and the film’s secetion topography is detected by a scanning electron microscope(SEM).The results show that the thickness decreses as the layer number increases,indicating the decreasing deposition rate with time.By spectra inversion,an exponential changing model is established.After optimization,the fitting accuracy between theoretical curve and measured data is greatly improved.This study can be used to correct film thickness in a timerate monitoring system.

关 键 词：离子束溅射 沉积速率 光谱拟合 膜厚监控 中红外 

分 类 号：O484.4[理学—固体物理]