光学玻璃超精密抛光加工中材料去除机理研究综述  

A Review of Material Removal Mechanism in Ultra-Precision Polishing of Optical Glass

作　　者：蒋小为 龙兴武[1] 谭中奇[1] Jiang Xiaowei;Long Xingwu;Tan Zhongqi(College of Advanced Interdisciplinary Studies,National University of Defense Technology,Changsha Hunan 410073 China)

机构地区：[1]国防科技大学前沿交叉学科学院,湖南长沙410073

出　　处：《中国激光》2021年第4期231-248,共18页Chinese Journal of Lasers

基　　金：湖南省研究生教育创新工程和专业能力提升工程项目(CX20200016);国防科技大学自主科研专项项目(ZZKY-YX-07-01)。

摘　　要：光学玻璃以其优异的物理性能被广泛应用于航天、信息、能源、化工、微电子等领域。随着这些领域的不断发展,传统技术已无法满足日新月异的光学元件超光滑表面加工的要求。为此,需要针对光学玻璃表面的超精密抛光加工展开深入且广泛的研究。在诸多有关超精密抛光加工技术的研究中,光学玻璃材料的抛光去除机理始终是人们的研究重点。为此,本文从超抛加工涉及的基本组件、材料去除的物理机理、材料去除的化学机理三个方面入手,对光学玻璃超精密抛光加工中材料去除机理进行综述,目的是掌握国内外学术界对于该问题的认识,并据此提出若干问题的思考,以期指导工程实践,进一步提升超光滑表面的成形能力。Significance Ultra-precision optical processing technology is a necessary means to manufacture high-performance optical components,affecting all aspects of human production and life.With the development of modern science and technology,it has been widely and profoundly applied in various fields,from the glass screen for mobile phones to the ultra-short and ultra-powerful laser experimental devices of PW order,which are supported by ultra-precision optical processing.In the fields of integrated circuit manufacturing,chip manufacturing and other ultra-precision optical processing,ultra-precision optical processing is even the"soul of technology",its technical level directly determines the processing quality and service life of optical elements,furthermore determines the performance limit of optical system.As an important research direction of ultra-precision optical manufacturing,ultra-polishing has always got the researchers′attention.Many of the core techniques used in the polishing process have been studied in the past,but the acquisition of ultra-smooth surfaces severely depends on the experience of the processors.Considering the significance of ultra-polishing in exploring technical limits in many fields and the current situation that actual polishing processing relies heavily on operational experience,it is necessary to deeply discuss the physical and chemical mechanisms of material removal in the ultra-polishing process represented by classical polishing and chemical-mechanical polishing.Progress The material removal mechanism in ultra-polishing can be simply divided into two aspects:physical process removal and chemical process removal.The physical process removal mechanism mainly includes mechanical removal mechanism and fluid mechanics removal mechanism.In terms of the research on mechanism of mechanical removal,Preston and other researchers initially summarized the"Preston equation"and its modified equation by the relationship between macroscopic physical quantities such as workpiece surface pressure,r

关 键 词：材料 光学玻璃 超光滑表面 抛光加工 材料去除机理 

分 类 号：O436[机械工程—光学工程]